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Micro/Nano Fabrication and Ultra-Precision Manufacturing for Applications in Magnetic Hard Disk Storage, Magnetic Random Access Memory (MRAM) and Magnetic Sensors
时间:2018-11-21 09:27    点击:   所属单位:先进材料与纳米科技学院
讲座名称 Micro/Nano Fabrication and Ultra-Precision Manufacturing for Applications in Magnetic Hard Disk Storage, Magnetic Random Access Memory (MRAM) and Magnetic Sensors
讲座时间 2018-11-23 15:00:00
讲座地点 南校区G楼 118报告厅
讲座人 罗锋(西班牙马德里纳米技术高等研究院高级研究员)
讲座人介绍

Feng Luo got his B. S. in 1999 and PhD in Materials Chemistry at College of Chemistry and Molecular Engineering, Peking University in 2004. Then he worked as a postdoc in Max-Planck-Institute for Microstructure Physics (Germany) and in the Laboratory for Micro- and Nanotechnology, Paul Scherrer Institut (Switzerland) until Oct. 2009. From 11/2009-11/2010, he was appointed as a principal investigator in the College of Engineering at Peking University. Since 12/2010 he works at IMDEA-Nanoscience (Madrid) as a researcher and from 2014, he becomes the senior research Professor and group leader of Multi-Functional Devices by Interface Control and Nano-engineering. He has published 46 publications with “h” index of 18 and total citations more than 1740 times He is also the referee of grant proposal for M-era foundation (http://www.m-era.net/) from 2013. He has been involved in more than 25 research projects and 10 projects as PI. These projects are now funded with the total budget of 1.15 Million Euro as the PI. His group has interests in three main research lines:

(1) Micro/Nano Fabrication and Ultra-Precision Manufacturing for Applications in Magnetic Hard Disk Storage, Magnetic Random Access Memory (MRAM) and Magneto-Optical Sensors (2) Tuning Physical Properties by Design and Controlling: Interface Engineering at Atomic Scale and Lithography Patterning (3) Advanced Characterization Techniques Based on X-ray and Electrons

讲座内容

A brief review over technologies focused on micro/nano fabrication and ultra-precision manufacturing has been descried for patterning devices in 10 nm tech-node and beyond. For applications in magnetic recording, a bit patterned media (BPM) consists of arrays of nanoscale magnetic islands where each bit of information is stored in an individual island, thus the entire bit volume defines the anisotropy energy rather than the volume of individual grains. Here we demonstrated that extreme Ultra-violet interference lithography (EUV-IL) has particular advantages for the fabrication of BPM due to the possibility to create the high resolution structures over large areas with a high throughput. This study will allow us to gain a valuable insight into the nanoscale switching behavior, giving an indication of the potential of XIL as a method of producing patterned media for future storage applications. For application in MRAM below sub-20 nm node by EUV/electron beam lithography, critical etching process has been fully discussed for mass production. Advanced lithography such as hole mask colloidal lithography, offers us possibilities to fabricate nanostructures in different dimensions and even to tune the constituent of the structures in such an easy fashion. Morphology tuning of a series of Au/Co/Au nanostructures which gradually evolve from disk to ring allows controlling their optical and magneto-optical spectral responses in the visible and near infrared ranges. Bimodal resonant behavior in the optical and MO activity is observed, and by either tuning the morphological parameters, or the distribution of the ferromagnetic constituent, the spectral response of MO activity shows a good tunability and fine control, not only in a wide wavelength range, but also in the relative ratio of the Low-energy and High-energy modes, which has great potential in detailed design for telecommunication and sensor devices.

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