加入收藏夹
联系我们
关于本站
个人主页
西电导航
西安电子科技大学
    当前位置:首页>>学术讲座
Particle Control for Clean Semiconductor Manufacturing
时间:2018-10-11 10:27    点击:   所属单位:先进材料与纳米科技学院
讲座名称 Particle Control for Clean Semiconductor Manufacturing
讲座时间 2018-10-18 14:00:00
讲座地点 南校区G楼118报告厅
讲座人 David Y.H. Pui 教授
讲座人介绍 Professor David Y. H. Pui is a Distinguished McKnight University Professor and LM Fingerson/TSI Inc. Chair in Mechanical Engineering at the University of Minnesota.  He is the Director of the Particle Technology Laboratory (PTL), and also the Director of the Center for Filtration Research (CFR) collaborating with 20 leading international filtration companies.  He has a broad range of research experience in aerosol and nanoparticle science and filtration technology and has over 290 journal papers and 40 patents.  He has developed several widely used commercial aerosol instruments and is a co-founder of Nanocopoeia for nano-formulation of pharmaceutical drugs.  Dr. Pui has received many awards, including the Max Planck Research Award (1993), the Humboldt Research Award for Senior U.S. Scientists (2000), the Fuchs Memorial Award (2010) -- the highest disciplinary award conferred jointly by the American, German and Japanese Aerosol Associations, and the Einstein Professorship Award (2013) by the Chinese Academy of Sciences (CAS).  Dr. Pui is a Member of the U.S. National Academy of Engineering (NAE).
讲座内容 Clean manufacturing of semiconductors requires developing control schemes to: 1. prevent particle deposition on critical surfaces, 2. resuspend deposited particles from surfaces, and 3. remove deposited particles using various cleaning techniques.  At the Center for Filtration Research (CFR) of the University of Minnesota, we have investigated all three particle control schemes in air/liquid/surface systems.
 
Several protection schemes have been investigated to prevent particle deposition in the atmospheric and vacuum systems.  Thermophoresis and cover plate approaches were shown to protect the critical surfaces from airborne particle contaminants effectively.  Metrologies were developed to investigate deposition-resuspension-cleaning processes.  The role of electrical charging and neutralization in particle transport and deposition will also be discussed.
 
For the comprehensive understanding of the particle detachment, theoretical and experimental studies on liquid filtration under the presence of repulsion were investigated. Surface interactions between particles and membrane were considered with an aid of torques acting on deposited particles. Our theoretical and experimental results allow a fundamental understanding of surface interactions used for various applications such as liquid filtration and surface cleaning in a wet phase.
 
Air jet cleaning for removing micron-sized deposited particles on a surface was experimentally and theoretically studied. Polystyrene latex particles were deposited on a wafer by electrophoresis. The experimentally obtained deposition spot size matched well with an analytical equation. Numerical particle resuspension model was developed by considering three different particle detachment mechanisms. The numerically predicted cleaning removal area was compared with the experimental data.
转载请注明出处:西安电子科技大学学术信息网
如果您有学术信息或学术动态,欢迎投稿。我们将在第一时间确认并收录,投稿邮箱: meeting@xidian.edu.cn
Copyright © 2011-2018 西安电子科技大学 
开发维护:电子工程学院网络信息中心  管理员:meeting@xidian.edu.cn 站长统计: